GaAs外延薄膜的As缺位研究
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Research on As absence in GaAs epitaxial film
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    摘要:

    研制太赫兹量子级联激光器的核心是制备以GaAs为代表的量子阱超晶格,在制备GaAs为代表的量子阱超晶格过程中,需要解决As缺位等基础性物理问题。采用激光分子束外延技术制备了GaAs外延薄膜,研究了实验参数对GaAs薄膜性能,特别是As缺位的影响。在线RHEED测试结果表明,GaAs可以实现外延生长。原位XPS和UPS等测试研究结果表明,激光分子束外延技术制备GaAs外延薄膜过程中存在As缺位问题,激光能量对GaAs薄膜中As含量具有明显的影响,要获得理想成分比的GaAs外延薄膜,需要较高的脉冲激光能量(600 mJ)。

    Abstract:

    The research of THz Quantum Cascade Lasers(QCL) includes basic theory and applications,which shows great scientific and applicable values. It is the hotspot in THz fields and has been paid attention to by many countries. To prepare THz QCL,GaAs quantum well superlattice needs to be obtained firstly. During the preparation of GaAs quantum well superlattice,the problem of As absence needs to be solved. In this paper,GaAs has been prepared by Laser Molecular Beam Epitaxy(LMBE) and the corresponding results have been studied. RHEED indicates that GaAs can grow layer by layer. The results of situ XPS,UPS et al,show that there exists the absence of As during the growth of GaAs,and the laser energy has obvious influence on the content of GaAs. To obtain the ideal ratio of Ga:As,a high laser energy of 600 mJ is needed.

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王雪敏,吴卫东*,阎大伟,王瑜英,唐永建. GaAs外延薄膜的As缺位研究[J].太赫兹科学与电子信息学报,2011,9(3):351~357

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  • 收稿日期:2011-03-30
  • 最后修改日期:2011-04-30
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